Plasma-assisted oxide removal from ruthenium-coated EUV optics-Reference-Cited by-同舟云学术

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Plasma-assisted oxide removal from ruthenium-coated EUV optics

Published:2018-04-21 Issue:15 Volume:123 Page:153301
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Dolgov A.¹,Lee C. J.¹²^ORCID,Bijkerk F.¹^ORCID,Abrikosov A.³,Krivtsun V. M.³,Lopaev D.⁴^ORCID,Yakushev O.³,van Kampen M.⁵

Affiliation:

1. XUV Optics Group, University of Twente, MESA+ Institute for Nanotechnology, Enschede, The Netherlands

2. Insitute of Engineering, Hogescholen Fontys, Eindhoven, The Netherlands

3. Institute for Spectroscopy RAS, Moscow, Russia

4. Skobeltsyn Institute for Nuclear Physics, Moscow State University, Moscow, Russia

5. ASML, Veldhoven, The Netherlands

Funder

Nederlandse Organisatie voor Wetenschappelijk Onderzoek

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5006771

Reference22 articles.

1. EUV lithography: main challenges

2. Low energy electron bombardment induced surface contamination of Ru mirrors

3. Detection and characterization of carbon contamination on EUV multilayer mirrors

4. Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography

5. Modeling radiation-induced carbon contamination of extreme ultraviolet optics

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Promotion of Plasma-Induced Deuterium Uptake in Ruthenium Films by Monolayer-Thick Tin Layers;ACS Applied Materials & Interfaces;2023-11-22

2. Studying the efficacy of hydrogen plasma treatment for enabling the etching of thermally annealed ruthenium in chemical solutions;Micro and Nano Engineering;2023-06

3. Surface-limited deuterium uptake of Ru films under plasma exposure;Journal of Applied Physics;2022-12-14

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