Promotion of Plasma-Induced Deuterium Uptake in Ruthenium Films by Monolayer-Thick Tin Layers-Reference-Cited by-同舟云学术

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Promotion of Plasma-Induced Deuterium Uptake in Ruthenium Films by Monolayer-Thick Tin Layers

Published:2023-11-22 Issue: Volume: Page:
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Wang S. C.¹²^ORCID,van Kampen M.³,Morgan T. W.¹

Affiliation:

1. DIFFER-Dutch Institute for Fundamental Energy Research, De Zaale 20, 5612 AJ Eindhoven, The Netherlands

2. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600MB Eindhoven, The Netherlands

3. ASML The Netherlands B.V., P.O. Box 324, 5500AH Veldhoven, The Netherlands

Funder

ASML

European Commission

Research Program of the Materials innovation institute

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.3c11245

Reference52 articles.

1. Spillover of physisorbed hydrogen from sputter-deposited arrays of platinum nanoparticles to multi-walled carbon nanotubes

2. Magic of hydrogen spillover: Understanding and application

3. Surface oxygen versus native oxide on tungsten: contrasting effects on deuterium retention and release

4. Sn etching with hydrogen radicals to clean EUV optics

5. Effect of Hydrogen Ion Energy in the Process of Reactive Ion Etching of Sn Thin Films by Hydrogen Plasmas

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Correction to “Promotion of Plasma-Induced Deuterium Uptake in Ruthenium Films by Monolayer-Thick Tin Layers”;ACS Applied Materials & Interfaces;2024-04-05

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