Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography-Reference-Cited by-同舟云学术

Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography

Published:2006-12 Issue:4 Volume:253 Page:1691-1708
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Madey Theodore E.,Faradzhev Nadir S.,Yakshinskiy Boris V.,Edwards N.V.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference101 articles.

1. Effects of radiation-induced carbon contamination on the performance of an EUV lithographic optic

2. Controlling contamination in Mo/Si multilayer mirrors by Si surface capping modifications

3. M.E. Malinowski, SEMATECH Project LITH113: EUV Optics Contamination Control Gas Blend Carbon Mitigation Data and Final Report, Report to International SEMATECH, Project LITH113, Agreement 399509-OJ.

4. Studies of EUV contamination mitigation

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