Laser‐induced photochemical etching of SiO2studied by x‐ray photoelectron spectroscopy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.96176
Reference7 articles.
1. Surface Etching by Laser‐Generated Free Radicals
2. Summary Abstract: Laser‐induced chemical etching of metals and semiconductors
3. Chemical vapor deposition of silicon using a CO2laser
4. Control of relative etch rates of SiO2 and Si in plasma etching
5. X-Ray Photoelectron Spectroscopy of SiO2-Si Interfacial Regions: Ultrathin Oxide Films
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