Hydrogen self-trapping near silicon atoms in Ge-rich SiGe alloys
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2193802
Reference14 articles.
1. Growth of strained Si and strained Ge heterostructures on relaxed Si[sub 1−x]Ge[sub x] by ultrahigh vacuum chemical vapor deposition
2. Activation and diffusion studies of ion-implanted p and n dopants in germanium
3. Strained Si/strained Ge dual-channel heterostructures on relaxed Si0.5Ge0.5 for symmetric mobility p-type and n-type metal-oxide-semiconductor field-effect transistors
4. Extremely high transconductance Ge/Si/sub 0.4/Ge/sub 0.6/ p-MODFET's grown by UHV-CVD
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1. Muonium defect levels in Czochralski-grown silicon-germanium alloys;Physical Review B;2010-11-10
2. Hydrogen–dopant interactions in SiGe and strained Si;Applied Physics Letters;2010-06-21
3. Hydrogen-Related Defects in Silicon, Germanium, and Silicon–Germanium Alloys;Defects in Microelectronic Materials and Devices;2008-11-19
4. Electrically active hydrogen-implantation-induced defects in Ge crystals and SiGe alloys;Thin Solid Films;2008-11
5. Formation of Hydrogen-Related Shallow Donors in Ge1-xSix Crystals Implanted with Protons;Solid State Phenomena;2007-10
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