Low-temperature chemical vapor deposition and scaling limit of ultrathin Ru films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1650044
Reference7 articles.
1. Electrodeposition of Copper Thin Film on Ruthenium
2. Chemical Vapor Deposition of Ruthenium and Ruthenium Dioxide Films
3. Growth Mechanism of Ru Films Prepared by Chemical Vapor Deposition Using Bis(ethylcyclopentadienyl)ruthenium Precursor
4. Chemical vapor deposition of Ru thin films by direct liquid injection of Ru(OD)[sub 3] (OD=octanedionate)
5. Chemical Vapor Deposition of Metallic Thin Films Using Homonuclear and Heteronuclear Metal Carbonyls
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