Chemical Vapor Deposition of Metallic Thin Films Using Homonuclear and Heteronuclear Metal Carbonyls
Author:
Affiliation:
1. Department of Chemistry, The Ohio State University, Columbus, Ohio 43210
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm9605330
Reference21 articles.
1. Magnetic switching in cobalt films by adsorption of copper
2. Electronic and Magnetic Materials
3. Organometallic chemical vapor deposition of cobalt and formation of cobalt disilicide
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