Chemical vapor deposition of Ru thin films by direct liquid injection of Ru(OD)[sub 3] (OD=octanedionate)-Reference-Cited by-同舟云学术

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Chemical vapor deposition of Ru thin films by direct liquid injection of Ru(OD)[sub 3] (OD=octanedionate)

Published:2000 Issue:5 Volume:18 Page:2400
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:J. Vac. Sci. Technol. A

Author:

Lee Jung-Hyun,Kim Joo-Young,Rhee Shi-Woo,Yang DooYoung,Kim Dong-Hyun,Yang Cheol-Hoon,Han Young-Ki,Hwang Chul-Ju

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Cited by 25 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Substrate Effects on the Growth Behavior of Atomic-Layer-Deposited Ru Thin Films Using RuO4 Precursor and N2/H2 Mixed Gas;The Journal of Physical Chemistry C;2019-08-27

2. Optimization of electrical treatment strategy for surface roughness reduction in conducting thin films;Journal of Applied Physics;2018-09-28

3. Ruthenium complexes as precursors for chemical vapor-deposition (CVD);RSC Adv.;2014

4. Kinetics of the ruthenium thin film deposition from supercritical carbon dioxide by the hydrogen reduction of Ru(tmhd)2cod;Microelectronic Engineering;2010-04

5. Deposition of highly pure ruthenium thin films with a new metal-organic precursor;Surface and Coatings Technology;2007-09

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