Sub-10 nm low current resistive switching behavior in hafnium oxide stack
Author:
Affiliation:
1. Institute of Microelectronics, Peking University, 100871 Beijing, China
2. IMEC, Kapeldreef 75, B-3001 Heverlee, Belgium
3. Department of Physics and Astronomy, KU Leuven, Celestijnenlaan 200D, B-3001 Heverlee, Belgium
Funder
NSTMP
National Natural Science Foundation of China (NSFC)
China Scholarship Council (CSC)
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4944841
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3. A fast, high-endurance and scalable non-volatile memory device made from asymmetric Ta2O5−x/TaO2−x bilayer structures
4. In situ observation of filamentary conducting channels in an asymmetric Ta2O5−x/TaO2−x bilayer structure
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