In situ method for real time measurement of dielectric film thickness in plasmas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3267307
Reference11 articles.
1. In-situ measurement of dielectric thickness during etching or developing processes
2. Beam profile reflectometry: A new technique for dielectric film measurements
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4. Process control in semiconductor manufacturing
5. Principles of Plasma Discharges and Materials Processing
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