Control of the spatial distribution of ion flux in dual inductively coupled plasmas
Author:
Affiliation:
1. Department of Electrical Engineering, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul 133-791, South Korea
Funder
National Research Foundation of Korea
Ministry of Trade, Industry and Energy
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
https://aip.scitation.org/doi/pdf/10.1063/5.0026248
Reference38 articles.
1. Review of inductively coupled plasmas for plasma processing
2. Inductive plasmas for plasma processing
3. Characteristics of Parallel Internal-Type Inductively Coupled Plasmas for Large Area Flat Panel Display Processing
4. Control of plasma density distribution via wireless power transfer in an inductively coupled plasma
5. Experimental investigation on plasma parameter profiles on a wafer level with reactor gap lengths in an inductively coupled plasma
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