Rapid thermal annealing of graphene-metal contact
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4769817
Reference24 articles.
1. Highly activated shallow Ga profiles in silicon obtained by implantation and rapid thermal annealing
2. Vacancy self-trapping during rapid thermal annealing of silicon wafers
3. Electrical characteristics and contact resistance of B+-and BF2+-implanted silicon diodes with furnace and rapid thermal annealing
4. Impact of Graphene Interface Quality on Contact Resistance and RF Device Performance
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