Thin, relaxed Si1−xGex virtual substrates on Si grown using C-doped Ge buffers
Author:
Affiliation:
1. Department of Electrical and Computer Engineering and Microelectronics Research Center, The University of Texas at Austin, 10100 Burnet Rd. Bldg. 160, Austin, Texas 78758, USA
Funder
NSF NASCENT ERC
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4898697
Reference26 articles.
1. Si/SiGe heterostructures: from material and physics to devices and circuits
2. Strained Si, SiGe, and Ge channels for high-mobility metal-oxide-semiconductor field-effect transistors
3. Fractional quantum Hall effect of two-dimensional electrons in high-mobility Si/SiGe field-effect transistors
4. Strained-Si/strained-Ge type-II staggered heterojunction gate-normal-tunneling field-effect transistor
5. Bandgap engineering of group IV materials for complementary n and p tunneling field effect transistors
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