A structural and topographical study of low-pressure chemical-vapor-deposited polysilicon by scanning probe microscopy
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.365232
Reference23 articles.
1. Retention and endurance characteristics of HCl-annealed and unannealed MNOS capacitors
2. The deposition of silicon from silane in a low-pressure hot-wall system
3. Structure and Stability of Low Pressure Chemically Vapor‐Deposited Silicon Films
4. Resistivity of LPCVD Polycrystalline‐Silicon Films
5. Structure and Properties of LPCVD Silicon Films
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1. Silicon nano-asperities: Morphological evolution and electrical properties of double-polysilicon interlayers;Journal of Electronic Materials;2004-07
2. Surface roughness measurements of micromachined polycrystalline silicon films;Journal of Micromechanics and Microengineering;2004-05-21
3. The mechanical strength of polysilicon films: Part 1. The influence of fabrication governed surface conditions;Journal of the Mechanics and Physics of Solids;2003-08
4. Experimentation at the Micron and Submicron Scale;Comprehensive Structural Integrity;2003
5. Quantum chemical simulation of silicon nanostructures;SPIE Proceedings;1999-04-08
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