Ions in holes: An experimental study of ion distributions inside surface features on radio-frequency-biased wafers in plasma etching discharges
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1486054
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3. Radio frequency sheath formation and excitation around a stepped electrode;Journal of Applied Physics;2005-03-15
4. Plasma molding over surface topography: simulation and measurement of ion fluxes, energies and angular distributions over trenches in RF high density plasmas;IEEE Transactions on Plasma Science;2003-08
5. Experimental and theoretical study of ion distributions near 300 μm tall steps on rf-biased wafers in high density plasmas;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2003-01
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