Chemical vapor deposition of monolayer-thin WS2 crystals from the WF6 and H2S precursors at low deposition temperature-Reference-Cited by-同舟云学术

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Chemical vapor deposition of monolayer-thin WS2 crystals from the WF6 and H2S precursors at low deposition temperature

Published:2019-03-14 Issue:10 Volume:150 Page:104703
ISSN:0021-9606
Container-title:The Journal of Chemical Physics
language:en
Short-container-title:J. Chem. Phys.

Author:

Groven B.¹²^ORCID,Claes D.¹²,Nalin Mehta A.²³^ORCID,Bender H.²,Vandervorst W.²³^ORCID,Heyns M.²⁴^ORCID,Caymax M.²,Radu I.²^ORCID,Delabie A.¹²^ORCID

Affiliation:

1. Department of Chemistry, KU Leuven (University of Leuven), Leuven 3001, Belgium

2. imec, Kapeldreef 75, 3001 Leuven, Belgium

3. Department of Physics, KU Leuven (University of Leuven), Leuven 3001, Belgium

4. Department of Materials Engineering, KU Leuven (University of Leuven), Leuven 3001, Belgium

Funder

Agentschap Innoveren en Ondernemen

Publisher

AIP Publishing

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5048346

Reference64 articles.

1. Recent developments of molybdenum and tungsten sulfides as hydrogen evolution catalysts

2. Single-layer MoS2 transistors

3. Electronics and optoelectronics of two-dimensional transition metal dichalcogenides

4. Ultrasensitive photodetectors based on monolayer MoS2

5. Few-Layer MoS2: A Promising Layered Semiconductor

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1. Guiding Principles for the Design of a Chemical Vapor Deposition Process for Highly Crystalline Transition Metal Dichalcogenides;physica status solidi (a);2024-03-09

2. Wafer-scale characterization for two-dimensional material layers;Japanese Journal of Applied Physics;2024-03-01

3. Growth of large edge length two-dimensional WS2 using a custom 12-zone atmospheric pressure chemical vapor deposition system;Journal of Vacuum Science & Technology A;2023-12-15

4. Challenges of Wafer‐Scale Integration of 2D Semiconductors for High‐Performance Transistor Circuits;Advanced Materials;2022-09-07

5. Optimisation of processing conditions during CVD growth of 2D WS2 films from a chloride precursor;Journal of Materials Science;2022-01

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