Model for the recombination velocity of silicon interstitials at nonoxidizing interfaces
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.369040
Reference23 articles.
1. Reduction of the reverse short channel effect in thick SOI MOSFET's
2. Anomalous temperature effect of oxidation stacking faults in silicon
3. 1D Simulation of Oxidation-Enhanced and Oxidation-Retarded Diffusion in Silicon and Validity of the Physical Model. Transition to the 2D Case
4. A study of silicon interstitial kinetics using silicon membranes: Applications to 2D dopant diffusion
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Phosphorous Diffusion in N2+-Implanted Germanium during Flash Lamp Annealing: Influence of Nitrogen on Ge Substrate Damage and Capping Layer Engineering;ECS Journal of Solid State Science and Technology;2017
2. Nonconservative Ostwald ripening of a dislocation loop layer under inert nitrogen-rich SiO2∕Si interfaces;Journal of Applied Physics;2006-05-15
3. Behavior of Si Interstitials and Boron-Interstitial Pairs at the Si/SiO2 Interface;MRS Proceedings;2004
4. Intrinsic Point Defects;Computational Microelectronics;2004
5. Silicon Self-Interstitial Cluster Formation and Dissolution in SOI;MRS Proceedings;2002
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3