Connection between hydrogen plasma treatment and etching of amorphous phase in the layer-by-layer technique with very high frequency plasma excitation-Reference-Cited by-同舟云学术

Connection between hydrogen plasma treatment and etching of amorphous phase in the layer-by-layer technique with very high frequency plasma excitation

Published:1999-03 Issue:5 Volume:85 Page:2991-2993
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Vetterl O.,Hapke P.,Houben L.,Finger F.,Carius R.,Wagner H.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.369616

Reference11 articles.

1. Effects of hydrogen atoms on the network structure of hydrogenated amorphous and microcrystalline silicon thin films

2. Roles of Atomic Hydrogen in Chemical Annealing

3. Role of Atomic Hydrogen During Growth of Hydrogenated Amorphous Silicon in the “Chemical Annealing”

4. Plasma deposition of microcrystalline silicon: the selective etching model

5. Control of silicon network structure in plasma deposition

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