H2/N2 plasma damage on porous dielectric SiOCH film evaluated by in situ film characterization and plasma diagnostics-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

H2/N2 plasma damage on porous dielectric SiOCH film evaluated by in situ film characterization and plasma diagnostics

Published:2011-04-15 Issue:8 Volume:109 Page:084112
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Yamamoto Hiroshi,Takeda Keigo,Ishikawa Kenji,Ito Masafumi,Sekine Makoto,Hori Masaru,Kaminatsui Takeshi,Hayashi Hisataka,Sakai Itsuko,Ohiwa Tokuhisa

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.3562161

Reference21 articles.

1. Thermal Decomposition of Low Dielectric Constant Pulsed Plasma Fluorocarbon Films: I. Effect of Precursors and Substrate Temperature

2. Low-kSi–O–C–H composite films prepared by plasma-enhanced chemical vapor deposition using bis-trimethylsilylmethane precursor

3. Dielectric property and microstructure of a porous polymer material with ultralow dielectric constant

4. Plasma damage mechanisms for low-k porous SiOCH films due to radiation, radicals, and ions in the plasma etching process

5. Structure-designable method to form super low-kSiOC film (k= 2.2) by neutral-beam-enhanced chemical vapour deposition

Cited by 28 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Comprehensive Review on the Impact of Chemical Composition, Plasma Treatment, and Vacuum Ultraviolet (VUV) Irradiation on the Electrical Properties of Organosilicate Films;Polymers;2024-08-05

2. Surface sulfurization of amorphous carbon films in the chemistry of oxygen plasma added with SO2 or OCS for high-aspect-ratio etching;Applied Surface Science;2024-02

3. Challenges in scaling of IPVD deposited Ta barriers on OSG low‐k films: Carbonization of Ta by CH_x radicals generated through VUV‐induced decomposition of carbon‐containing groups;Plasma Processes and Polymers;2024-01-22

4. Functional nitrogen science based on plasma processing: quantum devices, photocatalysts and activation of plant defense and immune systems;Japanese Journal of Applied Physics;2021-12-15

5. VUV radiation flux from argon DC magnetron plasma;Journal of Physics D: Applied Physics;2020-05-21

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3