Functional nitrogen science based on plasma processing: quantum devices, photocatalysts and activation of plant defense and immune systems

Author:

Kaneko ToshiroORCID,Kato Hiromitsu,Yamada Hideaki,Yamamoto Muneaki,Yoshida Tomoko,Attri Pankaj,Koga KazunoriORCID,Murakami Tomoyuki,Kuchitsu Kazuyuki,Ando SugihiroORCID,Nishikawa Yasuhiro,Tomita Kentaro,Ono Ryo,Ito Tsuyohito,Ito Atsushi M.ORCID,Eriguchi Koji,Nozaki TomohiroORCID,Tsutsumi Takayoshi,Ishikawa KenjiORCID

Abstract

Abstract Nitrogen is a very common element, comprising approximately 78% of Earth’s atmosphere, and is an important component of various electronic devices while also being essential for life. However, it is challenging to directly utilize dinitrogen because of the highly stable triple bond in this molecule. The present review examines the use of non-equilibrium plasmas to generate controlled electron impacts as a means of generating reactive nitrogen species (RNS) with high internal energy values and extremely short lifetimes. These species include ground state nitrogen atoms, excited nitrogen atoms, etc. RNS can subsequently react with oxygen and/or hydrogen to generate new highly reactive compounds and can also be used to control various cell functions and create new functional materials. Herein, plasma-processing methods intended to provide RNS serving as short-lived precursors for a range of applications are examined in detail.

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

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