Electrical and structural properties of poly-Si films grown by furnace and rapid thermal annealing of amorphous Si
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.368352
Reference14 articles.
1. XeCl Excimer laser annealing used in the fabrication of poly-Si TFT's
2. Enlargement of Poly-Si Film Grain Size by Excimer Laser Annealing and Its Application to High-Performance Poly-Si Thin Film Transistor
3. Crystal forms by solid‐state recrystallization of amorphous Si films on SiO2
4. Large grain polycrystalline silicon by low‐temperature annealing of low‐pressure chemical vapor deposited amorphous silicon films
5. High performance low-temperature poly-Si n-channel TFTs for LCD
Cited by 24 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Low doping in-situ strategy leading to polysilicon based TFTs exhibiting high stability under stress effects and enhanced electrical performances;Materials Research Express;2022-02-01
2. Novel Fabrication of Lightly Doped-Drain for Suppressing the Leakage Current in Polycrystalline Silicon Thin-Film Transistor;Journal of Nanoscience and Nanotechnology;2017-05-01
3. High-performance sidewall damascened tri-gate poly-si TFTs with the strain proximity free technique and stress memorization technique;Semiconductor Science and Technology;2017-01-09
4. Thermal Stress Effect on Nickel Silicide Seed-Induced Laterally Crystallized Polycrystalline-Silicon Thin-Film Transistors;Journal of Nanoscience and Nanotechnology;2016-09-01
5. Optical and electrical characterization of crystalline silicon films formed by rapid thermal annealing of amorphous silicon;Thin Solid Films;2016-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3