Stress hysteresis and mechanical properties of plasma-enhanced chemical vapor deposited dielectric films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1635647
Reference39 articles.
1. Ultralow-k dielectrics prepared by plasma-enhanced chemical vapor deposition
2. Stress‐Corrosion Cracking of Low‐Dielectric‐Constant Spin‐On‐Glass Thin Films
3. Stress hysteresis during thermal cycling of plasma-enhanced chemical vapor deposited silicon oxide films
4. Measurement of thermal stress and stress relaxation in confined metal lines. I. Stresses during thermal cycling
5. Measurement of thermal stress and stress relaxation in confined metal lines. II. Stress relaxation study
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