Effects of various substrate materials on structural and optical properties of amorphous silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

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Effects of various substrate materials on structural and optical properties of amorphous silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition

Published:2020 Issue:8 Volume:18 Page:083101
ISSN:1671-7694
Container-title:Chinese Optics Letters
language:en
Short-container-title:中国光学快报

Author:

Hang Liangyi,Liu Weiguo,Xu Junqi

Publisher

Shanghai Institute of Optics and Fine Mechanics

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

http://www.clp.ac.cn/EN/Article/OJ236545de6bce1134?type=pdf

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Suppression of crack formation in wafer-scale amorphous SiNx films by residual hydrogen-ligands manipulation;Nano Trends;2024-09

2. Effect of ion assistance on silicon nitride films deposited by reactive magnetron sputtering;Materials Science in Semiconductor Processing;2023-04

3. Design and preparation of high-transmittance broadband antireflection coatings with tailored refractive indices deposited by PECVD;Vacuum;2023-02

4. Effect of Cracks on Thermal Shock Behavior of Plasma-Sprayed Thick Thermal Barrier Coatings;Journal of Materials Engineering and Performance;2022-10-12

5. Preparation and characterization of graded-index antireflection coatings with a high laser-induced damage threshold;Optical Interference Coatings Conference (OIC) 2022;2022

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