Electrode oxygen-affinity influence on voltage nonlinearities in high-k metal-insulator-metal capacitors
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3447795
Reference21 articles.
1. Investigation of Scaling Limits for PECVD SiN and ALD HfO2/Al2O3 Integrated MIM Capacitors
2. Analog characteristics of metal-insulator-metal capacitors using PECVD nitride dielectrics
3. Microscopic model for dielectric constant in metal-insulator-metal capacitors with high-permittivity metallic oxides
4. Modeling of nonlinearities in the capacitance-voltage characteristics of high-k metal-insulator-metal capacitors
5. Nonlinear capacitance variations in amorphous oxide metal-insulator-metal structures
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