Investigation of point defect generation in dry etched InP ridge waveguide structures
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2743384
Reference12 articles.
1. CH[sub 4]-based dry etching of high Q InP microdisks
2. Quality factors in single-defect photonic-crystal lasers with asymmetric cladding layers
3. Characterization of surface damage in dry-etched InP
4. Dry etching of submicron gratings for InP laser structures-comparison of HI/H2, CH4/H2and C2H6/H2plasma chemistries
5. Study of reactive ion etching‐induced damage in GaAs/AlGaAs structures using a quantum well intermixing probe
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1. Impact of heat treatment process on threshold current density in AlGaN-based deep-ultraviolet laser diodes on AlN substrate;Applied Physics Express;2021-04-16
2. Intermixing in InP-Based Quantum Well Photonic Structures Induced by the Dry-Etching Process: A Spectral Imaging Cathodoluminescence Study;Materials Science Forum;2012-07
3. Single-Step RIE Fabrication Process of Low Loss InP Waveguide Using CH[sub 4]∕H[sub 2] Chemistry;Journal of The Electrochemical Society;2011
4. Cathodoluminescence Study of InP Photonic Structures Fabricated by Dry Etching;Journal of Electronic Materials;2010-03-26
5. Process induced mechanical stress in InP ridge waveguides fabricated by inductively coupled plasma etching;Applied Physics Letters;2008-09-29
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