CH[sub 4]-based dry etching of high Q InP microdisks-Reference-Cited by-同舟云学术

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CH[sub 4]-based dry etching of high Q InP microdisks

Published:2002 Issue:1 Volume:20 Page:301
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Choi Seung June,Djordjev Kostadin,Choi Sang Jun,Dapkus P. Daniel

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 41 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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4. Continuous-Wave Optically Pumped 1.55 μm InAs/InAlGaAs Quantum Dot Microdisk Lasers Epitaxially Grown on Silicon;ACS Photonics;2017-01-12

5. Vertical and Smooth Single-Step Reactive Ion Etching Process for InP Membrane Waveguides;Journal of The Electrochemical Society;2015

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