Reactively sputtered titanium carbide thin films: Preparation and properties
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.332478
Reference3 articles.
1. Diffusion barriers in thin films
2. Interfacial reactions between aluminum and transition‐metal nitride and carbide films
3. Interaction of reactively sputtered titanium carbide thin films with Si, SiO2Ti, TiSi2, and Al
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4. Structure and mechanical properties of TiC films deposited using combination of pulsed DC and normal DC magnetron co-sputtering;Applied Surface Science;2012-09
5. Preparation of Titanium Carbide Thin Film Using Plasma Focus Device;Journal of Fusion Energy;2011-05-08
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