Preparation of Titanium Carbide Thin Film Using Plasma Focus Device-Reference-Cited by-同舟云学术

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Preparation of Titanium Carbide Thin Film Using Plasma Focus Device

Published:2011-05-08 Issue:6 Volume:30 Page:516-522
ISSN:0164-0313
Container-title:Journal of Fusion Energy
language:en
Short-container-title:J Fusion Energ

Author:

Hosseinnejad M. T.,Ghorannevis Z.,Ghoranneviss M.,Soltanveisi M.,Shirazi M.

Publisher

Springer Science and Business Media LLC

Subject

Nuclear Energy and Engineering,Nuclear and High Energy Physics

Link

http://link.springer.com/content/pdf/10.1007/s10894-011-9422-3.pdf

Reference30 articles.

1. I. Zergioti, A. Hatziapostolou, E. Hontzopoulos, A. Zervaki, G.N. Haidemenopoulos, Thin Solid Films 271, 96 (1995)

2. M.L.F. Parames, O. Conde, Appl. Surf. Sci. 109–110, 554 (1997)

3. M. Eizenberg, S.P. Muraka, J. Appl. Phys. 54, 3190 (1983)

4. G. Georgiev, N. Feschiev, D. Popov, Z. Uzunov, Vacuum 36, 595 (1986)

5. J. Tang, J.S. Zabinski, J.E. Bultman, Surf. Coat. Technol. 91, 69 (1997)

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1. Structural, Morphological and Mechanical Characterisation of Molybdenum Nitride Thin Films Deposited by a Plasma Focus Device;Journal of Chemical Research;2017-12

2. Deposition of Alumina Films on Si (1 0 0) Substrate Using a Low Energy Dense Plasma Focus Device;Journal of Fusion Energy;2016-02-06

3. Characterization of nanostructured zinc oxide thin films synthesized at room temperature using low energy plasma focus device;Ceramics International;2015-12

4. Simulation of the plasma sheath dynamics in a spherical plasma focus;The European Physical Journal D;2015-09

5. Investigation of Effective Parameters on Metal Nitride Deposition by Plasma Focus Device: Number of Shots and Substrate Axial and Angular Positions;Journal of Fusion Energy;2015-06-21

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