Effects of the wall boundary conditions of a showerhead plasma reactor on the uniformity control of RF plasma deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4996998
Reference40 articles.
1. Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges
2. Effect of electrode spacing on the density distributions of electrons, ions, and metastable and radical molecules in SiH4/NH3/N2/He capacitively coupled plasmas
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4. Incorporating the gas flow in a numerical model of rf discharges in methane
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