Effects of the wall boundary conditions of a showerhead plasma reactor on the uniformity control of RF plasma deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4996998
Reference40 articles.
1. Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges
2. Effect of electrode spacing on the density distributions of electrons, ions, and metastable and radical molecules in SiH4/NH3/N2/He capacitively coupled plasmas
3. Roughness assessment and wetting behavior of fluorocarbon surfaces
4. Incorporating the gas flow in a numerical model of rf discharges in methane
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1. Effects of the Electrode Temperature on Spatial Distributions of Plasma Parameters in Intermediate Pressure Capacitively Coupled Plasmas;2020 IEEE International Conference on Plasma Science (ICOPS);2020-12-06
2. Numerical Characteristics of Silicon Nitride SiH4/NH3/H2 Plasma Discharge for Thin Film Solar Cell Deposition;Lecture Notes in Electrical Engineering;2020-08-15
3. The ion kinetics at the wafer edge by the variation of geometry and permittivity of the focus ring in capacitively coupled discharges;Journal of Applied Physics;2019-12-21
4. Model description of a two-dimensional electrostatic particle-in-cell simulation parallelized with a graphics processing unit for plasma discharges;Plasma Research Express;2019-03-04
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