Incorporating the gas flow in a numerical model of rf discharges in methane
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1782951
Reference22 articles.
1. Amorphous carbon
2. RF Plasmas in Methane: Prediction of Plasma Properties and Neutral Radical Densities with Combined Gas-Phase Physics and Chemistry Model
3. Plasma processes in methane discharges during r.f. plasma-assisted chemical vapour deposition of a-C:H thin films
4. Deposition mechanism of hydrogenated hard‐carbon films in a CH4rf discharge plasma
5. Electron and chemical kinetics in methane rf glow‐discharge deposition plasmas
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Effect of electrode heating on the distribution of the ion production rate in a capacitively coupled plasma deposition reactor in consideration of thermal decomposition;Vacuum;2021-07
2. Analysis of thermal diffusion effects observed in a capacitively coupled plasma deposition reactor with non-isothermal walls;Vacuum;2021-05
3. Numerical analysis for optimization of the sidewall conditions in a capacitively coupled plasma deposition reactor;Journal of Applied Physics;2019-11-07
4. Gas flow characteristics of argon inductively coupled plasma and advections of plasma species under incompressible and compressible flows;Chinese Physics B;2018-12
5. Uniformity control of the deposition rate profile of a-Si:H film by gas velocity and temperature distributions in a capacitively coupled plasma reactor;Journal of Applied Physics;2018-03-21
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3