Effect of electrode spacing on the density distributions of electrons, ions, and metastable and radical molecules in SiH4/NH3/N2/He capacitively coupled plasmas-Reference-Cited by-同舟云学术

Effect of electrode spacing on the density distributions of electrons, ions, and metastable and radical molecules in SiH4/NH3/N2/He capacitively coupled plasmas

Published:2015-07-28 Issue:4 Volume:118 Page:043304
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Kim Ho Jun,Yang Wonkyun,Joo Junghoon

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4927531

Reference54 articles.

1. Mechanism of SiN x H y Deposition from NH 3 ‐ SiH4 Plasma

2. Mechanism of SiNxHy deposition from N2–SiH4 plasma

3. Amorphous silicon nitride deposited at 120 °C for organic light emitting display-thin film transistor arrays on plastic substrates

4. Influence of the high-temperature “firing” step on high-rate plasma deposited silicon nitride films used as bulk passivating antireflection coatings on silicon solar cells

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