Author:
Lee Chang-Chun,Liou Yan-Yu,Chang Che-Pei,Huang Pei-Chen,Huang Chih-Yung,Chen Kuan-Chou,Lin Yi-Jiun
Funder
Taiwan Ministry of Science and Technology
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference32 articles.
1. Characterization & optimization of low stress PECVD silicon nitride for production GaAs manufacturing;Mackenzie,2004
2. Plasma-enhanced chemical vapour-deposited silicon nitride films; the effect of annealing on optical properties and etch rates;Wright;Sol. Energy Mater. Sol. Cells,2008
3. Comparison between HDP CVD and PECVD silicon nitride for advanced interconnect applications;Yota,2000
4. HiPIMS deposition of silicon nitride for solar cell application;Tiron;Surf. Coat. Technol.,2018
5. Characterization and in-line control of UV-transparent silicon nitride films for passivation of FLASH devices;Zheng,1996
Cited by
3 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献