Initial stages of native oxide growth on hydrogen passivated Si(111) surfaces studied by scanning tunneling microscopy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.107325
Reference12 articles.
1. Growth of native oxide on a silicon surface
2. Control factor of native oxide growth on silicon in air or in ultrapure water
3. Oxidation of etched silicon in air at room temperature; Measurements with ultrasoft X-ray photoelectron spectroscopy (ESCA) and neutron activation analysis
4. Reaction of water with hydrofluoric acid treated silicon(111) and (100) surfaces
5. Oxidation of HF‐treated Si wafer surfaces in air
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