Negative charge injection to a positively charged SiO2 hole exposed to plasma etching in a pulsed two-frequency capacitively coupled plasma in CF4/Ar
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1630163
Reference17 articles.
1. Dielectric film etching in semiconductor device manufacturing
2. Two-dimensional CT images of two-frequency capacitively coupled plasma
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4. Spatial Structure of Electronegative Ar/CF4Plasmas in Capacitive RF Discharges
5. Behaviors of electron and negative-ion densities in low-pressure high-density inductively coupled plasmas of SF6, NF3, CF4, and C4F8 gases diluted with Ar
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