Spatial Structure of Electronegative Ar/CF4Plasmas in Capacitive RF Discharges
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Negative Ion Plasmas;Encyclopedia of Plasma Technology;2016-12-12
2. Two modes of capacitively coupled rf discharge in CF4;Plasma Sources Science and Technology;2010-11-16
3. Negative charge injection to a positively charged SiO2 hole exposed to plasma etching in a pulsed two-frequency capacitively coupled plasma in CF4/Ar;Applied Physics Letters;2003-12
4. The physical and mathematical basis of stratification in electronegative plasmas;Plasma Sources Science and Technology;2003-11-11
5. Numerical study of Ar/CF4/N2 discharges in single- and dual-frequency capacitively coupled plasma reactors;Journal of Applied Physics;2003-09-15
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