Temperature Dependence of Sputtering Yields of Ge (100) and (110) Surfaces
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1782133
Reference9 articles.
1. Temperature dependence of ejection patterns in Ge, Si, InSb, and InAs sputtering
2. Sputtering Yield of Germanium in Rare Gases
3. Positive-Ion Bombardment of Germanium and Silicon
4. Sputtering Experiments with 1‐ to 5‐keV Ar+ Ions
5. RANGE OF ENERGETIC Xe125 IONS IN MONOCRYSTALLINE SILICON
Cited by 20 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Surface defects created by low energy (20 < E < 240 eV) ion bombardment of Ge(001);Surface Science;1997-05
2. Investigation of the mechanism of Ar+ion‐assisted Cl2etching of GaAs{110}: Role of ion‐induced charge acceptor states;Journal of Applied Physics;1991-08
3. Radiation damage in silicon (001) due to low energy (60–510 eV) argon ion bombardment;Surface Science;1990-11
4. Sputtering of an Ni-P alloy in the amorphous and crystalline states;Soviet Atomic Energy;1989-08
5. Ar+–Si Sputtering in Low Temperature and High Vacuum Pressure Ranges;Japanese Journal of Applied Physics;1987-05-20
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