Ar+–Si Sputtering in Low Temperature and High Vacuum Pressure Ranges
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Published:1987-05-20
Issue:Part 1, No. 5
Volume:26
Page:768-769
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering