Synthesis and characterization of AlN thin films deposited using DC and RF magnetron sputtering
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Publisher
AIP Publishing
Link
http://aip.scitation.org/doi/pdf/10.1063/5.0017482
Reference17 articles.
1. Optical Properties of Amorphous AlN Thin Films on Glass and Silicon Substrates Grown by Single Ion Beam Sputtering
2. Influence of sputtering parameters on structures and residual stress of AlN films deposited by DC reactive magnetron sputtering at room temperature
3. Visible emission from amorphous AlN thin-film phosphors with Cu, Mn, or Cr
4. Phase evolution in aluminum nitride thin films on Si(100) prepared by radio frequency magnetron sputtering
5. Microstructure evolution of AlN films deposited under various pressures by RF reactive sputtering
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1. Nitrogen flow rate dependent atomic coordination, phonon vibration and surface analysis of DC magnetron sputtered nitrogen rich-AlN thin films;Physica B: Condensed Matter;2023-10
2. Mechanical and Tribological Properties of NbTiAlx, NbTiAl0.5Ny, and NbTiAl0.5N14-CHz Coatings with Various Aluminum Target Currents and Nitrogen and Acetylene Flow Rates;Journal of Materials Engineering and Performance;2022-11-28
3. Piezoelectric aluminum nitride thin-films: A review of wet and dry etching techniques;Microelectronic Engineering;2022-03
4. In situ N K-edge XANES study of iron, cobalt and nickel nitride thin films;Journal of Synchrotron Radiation;2021-08-09
5. Influence of Gas Annealing on Sensitivity of AlN/4H-SiC-Based Temperature Sensors;Materials;2021-02-02
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