Metal gate work function tuning by Al incorporation in TiN
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4866323
Reference20 articles.
1. Nitrogen Gas Flow Ratio and Rapid Thermal Annealing Temperature Dependences of Sputtered Titanium Nitride Gate Work Function and Their Effect on Device Characteristics
2. Titanium nitride as electrode for MOS technology and Schottky diode: Alternative extraction method of titanium nitride work function
3. Dual work function metal gate CMOS technology using metal interdiffusion
4. Triangular-channel Ge NFETs on Si with (111) sidewall-enhanced Ion and nearly defect-free channels
Cited by 64 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Nano-TiO2/TiN Systems for Electrocatalysis: Mapping the Changes in Energy Band Diagram across the Semiconductor|Current Collector Interface and the Study of Effects of TiO2 Electrochemical Reduction Using UV Photoelectron Spectroscopy;ACS Applied Materials & Interfaces;2024-09-04
2. Ab Initio Materials Modeling of Point Defects in a High-κ Metal Gate Stack of Scaled CMOS Devices: Variability Versus Engineering the Effective Work Function;Journal of Electronic Materials;2024-08-07
3. Thermal stability of TiN gate electrode for 4H-SiC MOSFETs and integrated circuits;Japanese Journal of Applied Physics;2024-08-01
4. Metal Boundary Effect Mitigation by HKMG Thermal Process Optimization in FinFET Integration Technology;IEEE Transactions on Electron Devices;2024-04
5. Characterization and Advanced Modeling of Dielectric Defects in Low-Thermal Budget RMG MOSFETs Using 1/f Noise Analysis;IEEE Transactions on Electron Devices;2024-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3