Experimental investigation on the spatial distribution of floating potential at the wafer-level in inductively coupled oxygen plasma
Author:
Affiliation:
1. Department of Electrical Engineering, Hanyang University, 222, Wangsimni-ro, Seongdong-gu, Seoul 04763, South Korea
2. Plasma Technology Research Center, National Fusion Research Institute, Gunsan 54004, South Korea
Funder
National Research Foundation of Korea
Ministry of Trade, Industry and Energy
Korea Electric Power Corporation
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5085703
Reference33 articles.
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5. Effect of plasma treatments on a porous low-k material – Study of pore sealing
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