Electron cyclotron resonance multicharged ion source with elemental boron-Reference-Cited by-同舟云学术

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Electron cyclotron resonance multicharged ion source with elemental boron

Published:1994-04 Issue:4 Volume:65 Page:1113-1115
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Kato Y.,Ishii S.

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1145081

Reference6 articles.

1. A high‐current microwave ion source for ion implantation

2. Improvement of an ECR multicharged ion source

3. Modelling for Production of Multicharged Ions in ECR Source

4. Theoretical studies on an empirical formula for sputtering yield at normal incidence

5. Sputtering yields of boron bombarded by light ions

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Sputtering‐assisted production of multicharged boron ions from solid material in a 2.45 GHz electron cyclotron resonance source;Review of Scientific Instruments;1996-06

2. ECR multicharged boron ion source using solid materials;Plasma Sources Science and Technology;1996-05-01

3. Enhanced production of multicharged boron ions by approaching a boride target to an ECR zone;Review of Scientific Instruments;1996-03

4. Improved design of cusp‐type electron‐cyclotron resonance ion sources;Review of Scientific Instruments;1995-07

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