Low temperature formation of higher-k cubic phase HfO2 by atomic layer deposition on GeOx/Ge structures fabricated by in-situ thermal oxidation
Author:
Affiliation:
1. School of Engineering, The University of Tokyo, 2-11-16 Yayoi, Bunkyo-ku, Tokyo 113-8656, Japan
2. Department of Information Science and Electronic Engineering, Zhejiang University, 38 Zheda Road, Hangzhou 310027, China
Funder
Grant-in-Aid for Scientific Research of Japan
National Natural Science Foundation of China (NSFC)
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4941538
Reference19 articles.
1. Maintaining the benefits of CMOS scaling when scaling bogs down
2. Channel structure design, fabrication and carrier transport properties of strained-Si/SiGe-on-insulator (strained-SOI) MOSFETs
3. Germanium channel MOSFETs: Opportunities and challenges
4. Ge based high performance nanoscale MOSFETs
5. High-κ gate dielectrics: Current status and materials properties considerations
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Atom-Scaled Hafnium Doping for Strengthening the Germanium Oxide Interfacial Layer of The Gate Stack of Germanium P-Type Metal-Oxide-Semiconductor Field Effect Transistor;ECS Journal of Solid State Science and Technology;2024-05-01
2. Solution-processed high-k dielectrics for improving the performance of flexible intrinsic Ge nanowire transistors: dielectrics screening, interface engineering and electrical properties;Journal of Physics D: Applied Physics;2019-09-26
3. Effects of post deposition annealing atmosphere on interfacial and electrical properties of HfO2/Ge3N4 gate stacks;Thin Solid Films;2019-04
4. Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices;Journal of Vacuum Science & Technology B;2018-09
5. Thickness-modulated anisotropic ferromagnetism in Fe-doped epitaxial HfO2 thin films;Applied Physics Letters;2017-10-23
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3