Ellipsometric study ofa‐Si:H thin films deposited by square wave modulated rf glow discharge
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.347343
Reference22 articles.
1. Enhancement of the plasma density and deposition rate in rf discharges
2. Effects of low‐frequency modulation on rf discharge chemical vapor deposition
3. Pulsed high rate plasma etching with variable Si/SiO2selectivity and variable Si etch profiles
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