Effects of low‐frequency modulation on rf discharge chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.100445
Reference4 articles.
1. Effects of inert gas dilution of silane on plasma‐deposited a‐Si:H films
2. Enhancement of the plasma density and deposition rate in rf discharges
3. Investigation of the growth kinetics of glow‐discharge hydrogenated amorphous silicon using a radical separation technique
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