Characterization of secondary ion emission processes of sub-MeV C60 ion impacts via analysis of statistical distributions of the emitted ion number-Reference-Cited by-同舟云学术

Characterization of secondary ion emission processes of sub-MeV C60 ion impacts via analysis of statistical distributions of the emitted ion number

Published:2016-12-20 Issue:23 Volume:145 Page:234311
ISSN:0021-9606
Container-title:The Journal of Chemical Physics
language:en
Short-container-title:J. Chem. Phys.

Author:

Hirata K.¹,Yamada K.²,Chiba A.²,Narumi K.²,Saitoh Y.²

Affiliation:

1. National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan

2. Takasaki Advanced Radiation Research Institute, National Institutes for Quantum and Radiological Science and Technology (QST), 1233 Watanuki, Takasaki, Gumma 370-1292, Japan

Publisher

AIP Publishing

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Reference19 articles.

1. Secondary electron emission induced by 5–30‐keV monatomic ions striking thin oxide films

2. Recent advances in understanding particle-induced electron emission from metal surfaces

3. Statistics of ion-induced kinetic electron emission: A comparison between experimental and Monte Carlo–simulated results

4. Statistics of electron emission induced by MeV H+ and He2+ ions

5. Secondary electron emission from Au by medium energy atomic and molecular ions

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