Point defect creation by proton and carbon irradiation of α-Ga2O3

Author:

Polyakov Alexander Y.1,Nikolaev Vladimir I.23,Meshkov Igor N.4,Siemek Krzysztof4ORCID,Lagov Petr B.15,Yakimov Eugene B.16ORCID,Pechnikov Alexei I.23ORCID,Orlov Oleg S.4,Sidorin Alexey A.4,Stepanov Sergey I.23,Shchemerov Ivan V.1,Vasilev Anton A.1ORCID,Chernykh Alexey V.1ORCID,Losev Anton A.7,Miliachenko Alexandr D.7,Khrisanov Igor A.7,Pavlov Yu.S.5ORCID,Kobets U. A.8,Pearton Stephen J.9ORCID

Affiliation:

1. National University of Science and Technology MISiS, Moscow, Leninsky pr. 4, Moscow 119049, Russia

2. Ioffe Institute, 26 Polytekhnicheskaya Str., St. Petersburg 194021, Russia

3. Perfect Crystals LLC, 28 Politekhnicheskaya str., 194064 St. Petersburg, Russia

4. Joint Institute for Nuclear Research, Joliot-Curie 6, Dubna, Moscow Region 141980, Russian Federation

5. Laboratory of Radiation Technologies, A. N. Frumkin Institute of Physical Chemistry and Electrochemistry Russian Academy of Sciences (IPCE RAS), Moscow 119071, Russia

6. Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences, 6 Academician Ossipyan str., Chernogolovka, Moscow Region 142432, Russia

7. Institute for Theoretical and Experimental Physics NRC “Kurchatov Institute,” B. Cheremushkinskaya 25, Moscow 117218, Russian Federation

8. Institute for Physics and Power Engineering, Bondarenko sq. 1, Obninsk 249033, Russian Federation

9. Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611, USA

Abstract

Films of α-Ga2O3 grown by Halide Vapor Phase Epitaxy (HVPE) were irradiated with protons at energies of 330, 400, and 460 keV with fluences 6 × 1015 cm−2 and with 7 MeV C4+ ions with a fluence of 1.3 × 1013 cm−2 and characterized by a suite of measurements, including Photoinduced Transient Current Spectroscopy (PICTS), Thermally Stimulated Current (TSC), Microcathodoluminescence (MCL), Capacitance–frequency (C–f), photocapacitance and Admittance Spectroscopy (AS), as well as by Positron Annihilation Spectroscopy (PAS). Proton irradiation creates a conducting layer near the peak of the ion distribution and vacancy defects distribution and introduces deep traps at Ec-0.25, 0.8, and 1.4 eV associated with Ga interstitials, gallium–oxygen divacancies VGa–VO, and oxygen vacancies VO. Similar defects were observed in C implanted samples. The PAS results can also be interpreted by assuming that the observed changes are due to the introduction of VGa and VGa–VO.

Funder

Ministry of Science and Higher Education of the Russian Federation

Defense Threat Reduction Agency

National Science Foundation

Publisher

AIP Publishing

Subject

General Physics and Astronomy

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1. Nanosilicon Stabilized With Ligands: Effect of High‐Energy Proton Beam on Luminescent Properties;Surface and Interface Analysis;2024-08-30

2. Study of the Abnormally High Photocurrent Relaxation Time in α-Ga2O3-Based Schottky Diodes;Russian Microelectronics;2023-12

3. Nature of the abnormally high photocurrent relaxation time in the a-Ga2O3-based Schottky diodes;Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering;2023-07-07

4. Conducting surface layers formed by hydrogenation of O-implanted β-Ga2O3;Journal of Alloys and Compounds;2023-06

5. Carrier removal rates in 1.1 MeV proton irradiated α-Ga2O3 (Sn);Journal of Physics D: Applied Physics;2023-05-09

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