Stresses and strains in lattice‐mismatched stripes, quantum wires, quantum dots, and substrates in Si technology
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.362678
Reference101 articles.
1. Stress‐related problems in silicon technology
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3. Effect of crystallographic alignment of isolation trenches: A resolved‐shear‐stress perspective
4. Film‐edge‐induced stress in substrates
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