Magnetic tunnel junction pattern technique
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1543867
Reference3 articles.
1. High rate dry etching of Ni0.8Fe0.2 and NiFeCo
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3. RHEA (resist-hardened etch and anodization) process for fine-geometry Josephson junction fabrication
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2. Dry etching strategy of spin-transfer-torque magnetic random access memory: A review;Journal of Vacuum Science & Technology B;2020-09
3. Process deviation based electrical model of voltage controlled magnetic anisotropy magnetic tunnel junction and its application in read/write circuits;Acta Physica Sinica;2020
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