Application of low hydrogen-diluted and low gaseous-pressure monosilane plasma to fast deposition of solar-cell-grade microcrystalline silicon
Author:
Affiliation:
1. Development Division, Komatsu Ltd.
2. KELK Ltd.
3. Department of Materials Science, Tokai University
Publisher
The Materials Research Society of Japan
Link
https://www.jstage.jst.go.jp/article/tmrsj/41/4/41_385/_pdf
Reference27 articles.
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5. [5] D. Han, J.D. Lorentzen, J. Weinberg-Wolf, L.E. McNeil, and Q. Wang, J. Appl. Phys. 94, 2930 (2003).
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1. Optimized hydrogen concentration within a remotely induced hollow-anode plasma for fast chemical-vapor-deposition of photosensitive and <110>-preferential microcrystalline silicon thin-films;Thin Solid Films;2020-01
2. Remotely induced high-density hollow-anode plasma and its application to fast deposition of photosensitive microcrystalline silicon thin film with preferential <110> orientation;AIP Advances;2019-05
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