1. Plasma Processing for VLSI, Einspruch, N. and Brown, D., Eds., New York: Academic, 1984.
2. Wolf, S. and Tauber, R.N., Silicon Processing for the VLSI Era: Volume 1. Process Technology, New York: Lattice, 2000.
3. Pivovarenok, S.A., Dunaev, A.V., Murin, D.B., Efremov, A.M., and Svettsov, V.I., High Temp., 2011, vol. 49, no. 4, p. 491.
4. Efremov, A.M., Pivovarenok, S.A., and Svettsov, V.I., Russ. Microelectron., 2009, vol. 38, no. 3, p. 147.
5. Fuller, N.C.M., Donnelly, V.M., and Herman, I.P., J. Vac. Sci. Technol., A, 2002, vol. 20, p. 170.